Arisa Oka

Title: Arisa Oka: Innovator in Silicon Technology

Introduction

Arisa Oka is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of silicon technology, particularly in the development of advanced structures and manufacturing methods.

Latest Patents

Arisa Oka holds a patent for a structure, method for manufacturing the same, and a Talbot interferometer. This innovative structure includes a silicon substrate with multiple recessed portions, each featuring a bottom and a side wall. The design incorporates silicide layers that are in contact with the bottoms of these recessed portions. Additionally, a metal structure is included, with metal portions disposed within the recessed portions and in contact with the silicide layers. The silicide layers are electrically connected through the silicon substrate, showcasing a sophisticated approach to silicon technology.

Career Highlights

Arisa Oka is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. Her work at Canon has allowed her to explore and develop cutting-edge technologies that enhance the capabilities of silicon-based devices.

Collaborations

Arisa collaborates with Takayuki Teshima, a fellow innovator in her field. Their partnership exemplifies the spirit of teamwork and innovation that drives advancements in technology.

Conclusion

Arisa Oka's contributions to silicon technology and her innovative patent highlight her role as a key figure in the field. Her work continues to influence advancements in technology, making her a notable inventor in the industry.