Company Filing History:
Years Active: 2023-2025
Title: Aravind Alwan: Innovator in Plasma Sheath Tuning Technology
Introduction
Aravind Alwan is a notable inventor based in San Jose, California. He has made significant contributions to the field of plasma sheath tuning technology. His innovative work has led to the development of a unique patent that enhances substrate support systems.
Latest Patents
Aravind Alwan holds a patent for "Replaceable and/or collapsible edge ring assemblies for plasma sheath tuning incorporating edge ring positioning and centering features." This patent describes a first edge ring for a substrate support, which includes an annular-shaped body and one or more lift pin receiving elements. The design of the annular-shaped body is specifically tailored to surround the upper portion of the substrate support. It features an upper surface, a lower surface, a radially inner surface, and a radially outer surface. The lift pin receiving elements are strategically placed along the lower surface to ensure kinematic coupling with the top ends of three or more lift pins. This innovation is crucial for improving the efficiency and effectiveness of plasma processing.
Career Highlights
Aravind Alwan is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role at Lam Research allows him to apply his expertise in plasma technology and contribute to advancements in semiconductor manufacturing processes.
Collaborations
Throughout his career, Aravind has collaborated with talented individuals such as Alejandro C Sanchez and Grayson Ford. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Aravind Alwan's contributions to plasma sheath tuning technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at Lam Research Corporation highlight his commitment to advancing technology in this critical field.