Company Filing History:
Years Active: 2023
Title: Anu Mallikarjunan: Innovator in Chemical Mechanical Planarization
Introduction
Anu Mallikarjunan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing through his innovative work in chemical mechanical planarization.
Latest Patents
Anu holds a patent for a "Chemical mechanical planarization composition for polishing oxide materials and method of use thereof." This patent describes polishing compositions that comprise ceria coated silica particles and organic acids, which include sulfonic acid groups, phosphonic acid groups, pyridine compounds, and combinations thereof. The compositions have a pH between 5 and 10 and an electrical conductivity between 0.2 and 10 millisiemens per centimeter. These features provide very high silicon oxide removal rates, which are crucial for advanced semiconductor device manufacturing.
Career Highlights
Anu Mallikarjunan is currently employed at Versum Materials US, LLC, where he continues to develop innovative solutions for the semiconductor industry. His expertise in chemical mechanical planarization has positioned him as a key player in enhancing manufacturing processes.
Collaborations
Anu has collaborated with talented coworkers, including Ming-Shih Tsai and Chia-Chien Lee, who contribute to the innovative environment at Versum Materials.
Conclusion
Anu Mallikarjunan's work in chemical mechanical planarization exemplifies the importance of innovation in semiconductor manufacturing. His contributions are paving the way for advancements in the industry.