Anton Sergeevich Anisimov

Title: Anton Sergeevich Anisimov: Innovator in Oriented Deposition Technologies

Introduction

Anton Sergeevich Anisimov is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of gas phase deposition technologies, particularly in the development of high aspect ratio molecular structures.

Latest Patents

Anisimov holds a patent for "Apparatuses and method for oriented deposition." This invention presents apparatuses and methods for the gas phase deposition of high aspect ratio molecular structures, known as HARM-structures. The first aspect of the patent relates to an apparatus designed for the oriented gas phase deposition of HARM-structures on a filter. The second aspect involves an apparatus configured for the oriented gas phase deposition of HARM-structures on a substrate. Additionally, a system comprising multiple apparatuses according to the second aspect is also included. The elements of these apparatuses are arranged to create a laminar flow of gas containing HARM-structures in the deposition area, directing this flow at least partially parallel to the deposition area. Furthermore, the invention includes a method for oriented deposition of HARM-structures, suitable for both filters and substrates. Anisimov has 1 patent to his name.

Career Highlights

Anisimov is currently associated with Canatu Finland Oy, a company known for its innovative approaches in the field of nanotechnology and materials science. His work at Canatu has allowed him to explore and develop advanced deposition techniques that have potential applications in various industries.

Collaborations

Throughout his career, Anisimov has collaborated with notable colleagues, including Ilkka Varjos and Bjørn Fridur Mikladal. These collaborations have contributed to the advancement of technologies in their respective fields.

Conclusion

Anton Sergeevich Anisimov is a pioneering inventor whose work in oriented deposition technologies has the potential to impact various applications. His contributions to the field are marked by his innovative patent and collaborative efforts with esteemed colleagues.