The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
Apr. 20, 2020
Canatu Finland Oy, Vantaa, FI;
Ilkka Varjos, Espoo, FI;
Anton Sergeevich Anisimov, Espoo, FI;
Bjørn Fridur Mikladal, Helsinki, FI;
Dewei Tian, Kerava, FI;
Canatu Finland Oy, Vantaa, FI;
Abstract
Apparatuses and a method for gas phase deposition of high aspect ratio molecular structures, HARM-structures, are presented. The first aspect relates to an apparatus configured for oriented gas phase deposition of HARM-structures on a filter. The second aspect relates to an apparatus configured for oriented gas phase deposition of HARM-structures on a substrate. A system comprising multiple apparatuses according to the second aspect is also presented. Elements of the apparatuses are arranged to create a laminar flow of gas comprising HARM-structures in the deposition area, and to direct this flow at least partially parallel to the deposition area. Another aspect of the invention is a method for oriented deposition of HARM-structures, suitable for deposition both on a filter and a substrate.