Anthony M Ledger

Title: The Innovations of Anthony M Ledger

Introduction

Anthony M Ledger is an accomplished inventor based in New Fairfield, Connecticut. He has made significant contributions to the field of thin film metrology, particularly through his innovative patent that addresses the challenges of layer thickness determination. His work is instrumental in enhancing the accuracy of measurements in semiconductor manufacturing.

Latest Patents

Anthony M Ledger holds a patent for an invention titled "Automatic rejection of diffraction effects in thin film metrology." This invention involves a layer thickness determination system that detects the thickness of at least one layer disposed over a surface of a wafer. The system is designed to differentiate between regions with circuit features and those without, utilizing an optical system to collect light reflecting from the layer and the wafer surface. The system includes a camera for image acquisition and multiple light sources to illuminate the layer effectively. A data processor generates an image mask that distinguishes planar film regions from non-planar ones, allowing for precise thickness detection.

Career Highlights

Anthony M Ledger is associated with Integrated Process Equipment Corporation, where he applies his expertise in metrology and optical systems. His work at the company has contributed to advancements in the manufacturing processes of semiconductor devices.

Collaborations

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Conclusion

Anthony M Ledger's innovative contributions to thin film metrology exemplify the importance of precision in semiconductor manufacturing. His patent reflects a commitment to advancing technology in this critical field.