This inventor holds 4 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1997-2002.
Company Filing History:
Years Active: 1997-2002
Title: Anthony John Canale: Innovator in Semiconductor Technology
Introduction
Anthony John Canale is a notable inventor based in Essex Junction, VT (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work primarily focuses on methods that enhance the efficiency and effectiveness of semiconductor fabrication processes.
Latest Patents
One of Canale's latest patents is titled "Multi-layer hard mask for deep trench silicon etch." This invention describes a method of etching multiple films with a dual layer hard mask, where one layer is completely removed while the other is partially removed during the deep trench etching of silicon substrates. The process involves providing a semiconductor substrate capable of being etched, utilizing a specific gas mixture, and depositing layers of materials that allow for selective removability. This innovative approach enables the formation of closely spaced trenches in silicon substrates.
Another significant patent is "Polysilicon mini spacer for trench buried strap formation." This method outlines the formation of a semiconductor trench capacitor cell with a buried strap. It involves a substrate with a trench where a conductor is separated from the trench walls by dielectric material. The process includes removing a portion of the dielectric material and filling the space with a diffusible material, followed by annealing to create conductive elements that diffuse into the diffusible material.
Career Highlights
Anthony John Canale is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in semiconductor technologies. His work has contributed to advancements in the efficiency of semiconductor manufacturing processes, making a lasting impact in the industry.
Collaborations
Canale has collaborated with notable coworkers such as John Edward Cronin and Randy Dean Cox. Their combined expertise has fostered an environment of innovation and creativity within their projects.
Conclusion
Anthony John Canale is a distinguished inventor whose work in semiconductor technology has led to multiple patents and significant advancements in the field. His contributions continue to shape the future of semiconductor fabrication processes.