Anthony F White

Title: The Innovative Contributions of Anthony F. White

Introduction

Anthony F. White is a notable inventor based in Cupertino, California, recognized for his significant contributions to the field of substrate processing systems. With a total of four patents to his name, White has demonstrated a commitment to advancing technology in this specialized area.

Latest Patents

Among his latest patents, one is titled "Substrate support for a thermal processing chamber." This invention features a substrate support, such as an edge ring, which includes an inner portion and an outer portion that extends radially outward. The inner portion is designed with a raised annular extension that forms a ridge for supporting a substrate. Another significant patent is "Reducing the deposition rate of volatile contaminants onto an optical component of a substrate processing system." This patent outlines a system and method for minimizing the deposition of volatile contaminants on optical components within a substrate processing system. It involves introducing a purge fluid into the processing system to create a barrier that reduces contamination.

Career Highlights

Throughout his career, Anthony F. White has worked with prominent companies, including Applied Materials, Inc. and Computervision Corporation. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects that push the boundaries of technology.

Collaborations

White has collaborated with talented individuals such as Abhilash J. Mayur and Lewis A. Stern, further enhancing his work through shared expertise and insights.

Conclusion

Anthony F. White's innovative patents and career achievements highlight his significant role in the advancement of substrate processing technology. His contributions continue to influence the industry and inspire future innovations.