Newburgh, NY, United States of America

Anthony F Scaduto

This inventor holds 4 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1984-1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anthony F Scaduto. Retrieved from https://idiyas.com/inventor/anthony-f-scaduto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 4

Forward Citations = 306(Granted Patents)


Company Filing History:


Years Active: 1984-1989

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4 patents (USPTO):Explore Patents

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I'm pleased to provide an article about the esteemed inventor Anthony F Scaduto:

Title: Innovator Spotlight: Anthony F Scaduto

Introduction: Anthony F Scaduto, a talented inventor based in Newburgh, NY, has made significant contributions to the field of integrated circuit manufacture through his innovative processes.

Latest Patents: Anthony F Scaduto's latest patents include the groundbreaking "Mask using lithographic image size reduction." This patent discloses a unique process for reducing lithographic image size in integrated circuit manufacturing, significantly enhancing efficiency and precision in this crucial industry.

Career Highlights: With a total of 4 patents to his name, Anthony F Scaduto has proven himself as a pioneer in his field. His dedication to advancing technology and pushing boundaries is evident in his inventive solutions.

Collaborations: Throughout his career, Anthony F Scaduto has collaborated with notable coworkers such as Alexander D Lopata and Nicholas J Giammarco. Together, they have worked on cutting-edge projects that have shaped the landscape of integrated circuit manufacturing.

Conclusion: In conclusion, Anthony F Scaduto stands out as a visionary inventor whose contributions have had a lasting impact on the industry. His innovative processes continue to drive progress and innovation in integrated circuit manufacture.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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