Annette J Krisko

Title: Annette J Krisko: Innovator in Plasma Enhanced Chemical Vapor Deposition

Introduction

Annette J Krisko is a prominent inventor based in Highland, MI (US), known for her contributions to the field of plasma enhanced chemical vapor deposition. With a total of 5 patents, she has made significant advancements in the technology used for material deposition.

Latest Patents

One of her latest patents is an "Apparatus for microwave plasma enhanced physical/chemical vapor." This innovative apparatus includes an evacuable deposition chamber with a plasma region and a deposition region adjacent to one another. It features a source of microwave energy and a microwave waveguide to transfer energy to the plasma region. The apparatus is designed to hold solid or liquid starting materials and includes a system of flow controllers for introducing gaseous materials into the plasma region. The interaction of microwave energy with these materials forms a plasma that provides thermal energy for evaporation and reaction processes. Another notable patent is the "Plasma enhanced chemical vapor deposition of oxide film stack," which allows for the deposition of high-quality oxide films even on non-receptive substrates like glass.

Career Highlights

Throughout her career, Annette has worked with notable companies such as Energy Conversion Devices, Inc. and Ford Motor Company. Her work has significantly impacted the development of advanced deposition techniques, enhancing the quality and efficiency of material applications.

Collaborations

Annette has collaborated with esteemed colleagues, including Joachim Doehler and Stephen J Hudgens, contributing to various innovative projects in her field.

Conclusion

Annette J Krisko's work in plasma enhanced chemical vapor deposition showcases her dedication to innovation and excellence in material science. Her patents and career achievements reflect her significant contributions to the industry.