Location History:
- Walled Lake, MI (US) (1986 - 1988)
- Royal Oak, MI (US) (1986 - 1988)
- Highland, MI (US) (1988)
Company Filing History:
Years Active: 1986-1988
Title: Annette G Johncock: Innovator in Semiconductor Technology
Introduction
Annette G Johncock is a prominent inventor based in Royal Oak, MI (US), known for her significant contributions to the field of semiconductor technology. With a total of 11 patents to her name, she has made remarkable advancements in the manufacturing of coated articles and semiconductor materials.
Latest Patents
Among her latest patents is the "Coated article and method of manufacturing the article." This invention discloses a coated article featuring a substrate with an adherent, abrasion-resistant alkene-silane plasma reaction product coating. The coating is designed to be substantially transparent to visible light while partially absorbing ultraviolet light. It utilizes a plasma-assisted chemical vapor deposition process for application. Another notable patent is "Boron doped semiconductor materials and method for producing same." This patent describes an improved p-type semiconductor alloy film and an intrinsic amorphous semiconductor alloy film. These films enhance photovoltaic and photoresponsive devices and incorporate innovative methods for fabrication using r.f. and microwave glow discharge techniques.
Career Highlights
Throughout her career, Annette has worked with notable companies such as Energy Conversion Devices, Inc. and Ovonic Synthetic Materials Company Inc. Her work has significantly impacted the development of advanced materials in the semiconductor industry.
Collaborations
Annette has collaborated with esteemed colleagues, including Stephen J Hudgens and Prem Nath, contributing to her innovative projects and research.
Conclusion
Annette G Johncock's contributions to semiconductor technology and her impressive portfolio of patents highlight her role as a leading inventor in her field. Her work continues to influence advancements in materials science and engineering.