Anne C Friedman

Title: The Innovations of Anne C Friedman

Introduction

Anne C Friedman is a notable inventor based in Fishkill, NY (US). She has made significant contributions to the field of technology, particularly in the areas of substrate manufacturing and electronic devices. With a total of 2 patents, her work has had a considerable impact on the industry.

Latest Patents

One of her latest patents is titled "Using tensile mask to minimize buckling in substrate." This innovative method involves forming a mask over a substrate, which includes a first area with a pattern for creating multiple openings and an adjacent second area that is free of openings. The hard mask contains tensile stress, which is utilized to form the openings in the substrate. By partially eroding the hard mask, the substrate is left with openings and a substantially planar surface, effectively reducing buckling.

Another significant patent is "High-K and metal filled trench-type EDRAM capacitor with electrode depth and dimension control." This patent describes a process where partial removal of organic planarizing layer (OPL) material creates a plug of OPL material within an aperture. This plug protects underlying materials or electronic devices, such as deep trench capacitors, during various manufacturing processes. The OPL plug can absorb differences in etch rates across the chip or wafer, preserving previously formed recess dimensions and increasing manufacturing yield.

Career Highlights

Anne has worked with prominent companies in the technology sector, including GlobalFoundries Inc. and International Business Machines Corporation (IBM). Her experience in these organizations has allowed her to develop and refine her innovative ideas, contributing to advancements in the field.

Collaborations

Throughout her career, Anne has collaborated with talented individuals such as Sunit S Mahajan and Parul Dhagat. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Anne C Friedman is a distinguished inventor whose work has significantly influenced the technology landscape. Her innovative patents and collaborations highlight her commitment to advancing the field of substrate manufacturing and electronic devices.