Ankur Agarwal

Title: Ankur Agarwal: Innovator in Plasma Processing Technology

Introduction

Ankur Agarwal is a notable inventor based in Milpitas, California. He has made significant contributions to the field of plasma processing through his innovative work. His expertise and dedication to advancing technology have led to the development of a unique patent that addresses critical challenges in surface reactions.

Latest Patents

Ankur Agarwal holds a patent titled "System and method to adjust a kinetics model of surface reactions during plasma processing." This patent describes a system that includes a metrology tool designed to acquire measurements of a sample. The system features a controller with processors that execute program instructions to generate a surface kinetics model output. It determines the expected response of this model to polarized light and compares it to actual measurements. The system then generates metrics based on this comparison, adjusts parameters of the surface kinetics model, and applies the adjusted model to simulate performance during plasma processing. Ankur's innovative approach has the potential to enhance the efficiency and accuracy of plasma processing techniques.

Career Highlights

Ankur Agarwal is currently employed at Kla Corporation, where he continues to push the boundaries of technology in his field. His work at Kla Corporation has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in plasma processing.

Collaborations

Ankur has worked alongside colleagues such as Chad Huard and Yiting Zhang, fostering a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Ankur Agarwal's contributions to plasma processing technology through his patent and work at Kla Corporation highlight his role as a key innovator in the field. His dedication to improving surface reaction models demonstrates the impact of his work on advancing technology.