Heverlee, Belgium

Anjanashree Mankala Ramakrishna Sharma

This inventor holds 1 USPTO granted patent. Top assignees: Imec Vzw, Katholieke Universiteit Leuven. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anjanashree Mankala Ramakrishna Sharma. Retrieved from https://idiyas.com/inventor/anjanashree-mankala-ramakrishna-sharma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Anjanashree Mankala Ramakrishna Sharma and Semiconductor Diagnostics

Introduction

Anjanashree Mankala Ramakrishna Sharma is an inventor based in Heverlee, Belgium. His patent work includes a method for detecting and locating defects in semiconductor devices through lock-in averaging.

Latest Patents

Sharma is associated with 1 patent, titled “Lock-in Averaging for Semiconductor Diagnostics.” The invention describes switching a semiconductor device and an irradiating device on and off at different frequencies, then acquiring images of the device. Lock-in averaging with reference signals can produce temperature-indicative amplitudes, phase signals that help identify defect depth, and a surface topography. The method uses different frequencies and/or phases to distinguish these diagnostic measurements.

Career Highlights

Sharma’s listed professional affiliations include imec Vzw and Katholieke Universiteit Leuven. His patent reflects work in semiconductor diagnostics, particularly techniques for analyzing device surfaces and locating defects.

Collaborations

His affiliations connect his work with imec Vzw and Katholieke Universiteit Leuven, organizations associated with research and technology development.

Conclusion

Anjanashree Mankala Ramakrishna Sharma’s patent describes a lock-in averaging approach that combines image analysis and controlled signals to support semiconductor defect detection and characterization.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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