Anja Reitmeier

Title: Anja Reitmeier: Innovator in Semiconductor Technology

Introduction

Anja Reitmeier is a prominent inventor based in Wuppertal, Germany. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative approaches to manufacturing and processing semiconductor components.

Latest Patents

Anja's latest patents include a method for producing a conductor line and a method for processing a semiconductor workpiece with metallization. The first patent describes a technique for creating a rounded conductor line in a semiconductor component. This method involves using an etchant on a dielectric layer with varying etch rates, allowing for the formation of a trench that is subsequently filled with conductive material. The second patent focuses on processing a semiconductor workpiece that includes a metallization layer stack. This method utilizes a wet etching process that maintains consistent etching rates for different materials within the layer stack.

Career Highlights

Throughout her career, Anja has worked with notable companies such as Infineon Technologies AG and Infineon Technologies Austria AG. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in semiconductor technology.

Collaborations

Anja has collaborated with esteemed colleagues, including Hermann Wendt and Thomas Fischer, further enhancing her work in the semiconductor field.

Conclusion

Anja Reitmeier's innovative contributions to semiconductor technology and her collaborative efforts with industry professionals highlight her significant role in advancing this critical field. Her patents reflect her expertise and commitment to innovation in semiconductor manufacturing and processing.