San Jose, CA, United States of America

Anh-Kiet Quang Phan

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anh-Kiet Quang Phan. Retrieved from https://idiyas.com/inventor/anh-kiet-quang-phan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations of Anh-Kiet Quang Phan

Introduction

Anh-Kiet Quang Phan is an accomplished inventor based in San Jose, CA (US). He has made significant contributions to the field of materials science, particularly in the area of high-temperature etching processes.

Latest Patents

Phan holds a patent titled "Methods for high temperature etching a high-K material gate structure." This patent describes methods for etching high-k material at elevated temperatures. In one embodiment, the method involves providing a substrate with a high-k material layer in an etch chamber, forming a plasma from an etching gas mixture that includes at least a halogen-containing gas, and maintaining the temperature of the etch chamber's interior surface above 100 degrees Celsius while etching the high-k material layer.

Career Highlights

Phan is currently employed at Applied Materials, Inc., where he continues to innovate in the field of semiconductor manufacturing. His work focuses on improving etching techniques that are crucial for the development of advanced electronic devices.

Collaborations

Throughout his career, Phan has collaborated with notable colleagues, including Wei Liu and Eiichi Matsusue. These collaborations have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Anh-Kiet Quang Phan's work in high-temperature etching processes showcases his expertise and commitment to innovation in materials science. His contributions are vital to the ongoing development of semiconductor technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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