Jena, Germany

André Zowalla

This inventor holds 1 USPTO granted patent. Top assignee: Mi2-Factory Gmbh. Active years: 2026.


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: André Zowalla: Innovator in Ion Implantation Technology

Introduction

André Zowalla is a notable inventor based in Jena, Germany. He has made significant contributions to the field of ion implantation systems. His innovative work has led to the development of a unique energy filter assembly that enhances the efficiency of ion beam applications.

Latest Patents

Zowalla holds a patent for an "Energy filter assembly for ion implantation system with at least one coupling element." This invention includes an energy filter that features at least one filter element designed to absorb the beam energy of an ion beam. The assembly also incorporates a coupling element that elastically connects the first filter frame with the energy filter, ensuring optimal performance in ion implantation systems. He has 1 patent to his name.

Career Highlights

André Zowalla is currently employed at Mi2-Factory GmbH, where he continues to push the boundaries of innovation in his field. His work at the company focuses on developing advanced technologies that improve ion implantation processes.

Collaborations

Zowalla collaborates with Florian Krippendorf, contributing to the advancement of their projects and enhancing the overall impact of their innovations.

Conclusion

André Zowalla's contributions to ion implantation technology exemplify the spirit of innovation. His patent and ongoing work at Mi2-Factory GmbH highlight his commitment to advancing this critical field.

Profile summary based on public USPTO records.
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