André Orthen

Title: André Orthen: Innovator in Illumination Systems

Introduction

André Orthen is a notable inventor based in Essingen, Germany. He has made significant contributions to the field of illumination systems, particularly in the context of extreme ultraviolet (EUV) technology. With a total of two patents to his name, Orthen's work is recognized for its innovative approach and technical precision.

Latest Patents

Orthen's latest patents include a method for producing an illumination system for an EUV projection exposure system. This patent details a comprehensive approach to creating an illumination system specifically designed for EUV apparatuses. The second patent also focuses on the illumination system for EUV apparatuses, emphasizing the importance of effective illumination in advanced lithography processes.

Career Highlights

André Orthen is currently employed at Carl Zeiss SMT GmbH, a leading company in optical systems and lithography technology. His role at the company allows him to work on cutting-edge projects that push the boundaries of current technology. His expertise in illumination systems has positioned him as a key player in the development of EUV technology.

Collaborations

Orthen collaborates with talented professionals such as Juergen Baier and Daniel Runde. These collaborations enhance the innovative potential of his projects and contribute to the advancement of illumination systems in the industry.

Conclusion

André Orthen's contributions to the field of illumination systems, particularly in EUV technology, highlight his role as a significant inventor. His patents and work at Carl Zeiss SMT GmbH reflect his commitment to innovation and excellence in the industry.