Andrew R Coker

Title: The Innovative Contributions of Andrew R. Coker

Introduction

Andrew R. Coker is a notable inventor based in Macquarie Park, Australia. He has made significant contributions to the field of technology, particularly in the area of parametric patch rendering and tessellation. With a total of 4 patents to his name, Coker continues to push the boundaries of innovation.

Latest Patents

Coker's latest patents include a method, apparatus, and system for tessellating a parametric patch. This invention discloses a method of tessellating a parametric patch of an object by vectorizing a boundary curve associated with the patch according to a predetermined flatness tolerance. It involves determining a tessellation point based on the geometry of the patch and a tessellation step. Additionally, a color split point on the vectorized boundary curve is determined, which is essential for the tessellation process.

Another significant patent by Coker is a method, system, and apparatus for rendering a parametric patch. This invention defines a patch by its geometry and color, which varies according to surface mapping points. The method involves determining a set of intermediate values that represent an approximation of a shading color function. The patch is tessellated into multiple cells, and tessellation points are determined for each cell, allowing for an effective rendering of the patch using the intermediate values.

Career Highlights

Andrew R. Coker is currently employed at Canon Kabushiki Kaisha, where he applies his expertise in technology and innovation. His work has been instrumental in advancing the company's capabilities in rendering and tessellation technologies.

Collaborations

Coker has collaborated with notable colleagues such as Jun Liu and Hervé Soulard. These collaborations have contributed to the development of innovative solutions in their respective fields.

Conclusion

Andrew R. Coker's contributions to technology through his patents and work at Canon Kabushiki Kaisha highlight his role as a significant inventor. His innovative methods for tessellating and rendering parametric patches continue to influence advancements in the industry.