Andrew E Edd

Title: Andrew E Edd: Innovator in Thin Film Technology

Introduction

Andrew E Edd is a notable inventor based in Austin, TX, who has made significant contributions to the field of thin film technology. With a total of 2 patents to his name, Edd has developed innovative methods that enhance the efficiency and effectiveness of thin film applications.

Latest Patents

Edd's latest patents include a "Method for drying thin films in an energy efficient manner." This method involves conveying a thin film stack past a flashlamp, where it is irradiated with a composite light pulse composed of multiple micropulses. The design ensures that the time duration of the composite light pulse is shorter than the total thermal equilibration time of the thin film stack. Additionally, the thin film stack is required to move less than 10% of the length of the irradiating area during the delivery of the composite light pulse.

Another significant patent is the "Method for forming thin film conductors on a substrate." This process begins with the deposition of a thin film precursor material onto a porous substrate. The precursor material is then irradiated with a light pulse to transform it into a thin film that exhibits greater electrical conductivity. To further enhance the thin film's conductivity, compressive stress is applied to both the thin film and the porous substrate.

Career Highlights

Andrew E Edd is currently associated with Ncc Nano, LLC, where he continues to push the boundaries of thin film technology. His work has been instrumental in developing methods that not only improve the performance of thin films but also contribute to energy efficiency in their production.

Collaborations

Edd has collaborated with notable colleagues such as Charles C Munson and Kurt Anthony Schroder, contributing to a dynamic environment of innovation and research.

Conclusion

Andrew E Edd stands out as a key figure in the realm of thin film technology, with his innovative patents paving the way for advancements in the field. His contributions reflect a commitment to enhancing both the functionality and efficiency of thin film applications.