Andrew Aragon

Title: The Innovations of Andrew Aragon

Introduction

Andrew Aragon is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of Al/In/GaN films. With a total of 3 patents to his name, Aragon's work has the potential to impact various applications in electronics and materials science.

Latest Patents

One of Andrew Aragon's latest patents focuses on removing or preventing dry etch-induced damage in Al/In/GaN films through photoelectrochemical etching. This innovative method involves providing a substrate made of n-type Al/In/GaN semiconductor material. The process begins with dry-etching the surface of the substrate to create a trench, which results in dry-etch damage. To address this issue, the substrate is immersed in an electrolyte solution and illuminated with above bandgap light. This light generates electron-hole pairs in the n-type Al/In/GaN material, allowing for the photoelectrochemical etching of the surface to remove at least a portion of the dry-etch damage.

Career Highlights

Throughout his career, Andrew Aragon has worked with various organizations, including Stc.unm. His expertise in semiconductor materials and processes has positioned him as a valuable contributor to advancements in the field.

Collaborations

Andrew has collaborated with notable colleagues such as Morteza Monavarian and Daniel F Feezell. These partnerships have further enriched his research and development efforts.

Conclusion

In summary, Andrew Aragon is an accomplished inventor whose work in semiconductor technology has led to innovative solutions for addressing dry etch-induced damage. His contributions continue to influence the field and pave the way for future advancements.