This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Innovations of Andersen Chang in Semiconductor Technology
Introduction
Andersen Chang is a notable inventor based in Miaoli, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the dual damascene process. His innovative methods have improved the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
Andersen Chang holds a patent for a "Method for planarizing BARC layer in dual damascene process." This invention focuses on achieving a planar topography of the BARC layer through chemical mechanical polishing. By applying a low temperature to bake the coated BARC layer before cross-linking, the anti-reflective characteristics are induced. The method enhances the control of the BARC layer's formation, minimizing surface level variations and improving critical dimension control for vias.
Career Highlights
Andersen Chang is currently employed at United Microelectronics Corporation, where he continues to innovate in semiconductor processes. His work has been instrumental in advancing the technology used in integrated circuits and other electronic components.
Collaborations
Andersen has collaborated with notable colleagues, including Anseime Chen and Vencent Chang. Their combined expertise has contributed to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Andersen Chang's contributions to semiconductor technology, particularly through his patented methods, have made a significant impact on the industry. His work exemplifies the importance of innovation in advancing manufacturing processes.