Company Filing History:
Years Active: 2006-2013
Title: Ananth Naman: Innovator in Dielectric Materials
Introduction
Ananth Naman is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of dielectric materials. With a total of 8 patents to his name, Naman has developed innovative methods that enhance the properties and applications of organosilicate glass dielectric films.
Latest Patents
Naman's latest patents include a method for making toughening agent materials, which focuses on increasing the hydrophobicity of organosilicate glass dielectric films. This invention involves a composition that includes a component capable of alkylating or arylating silanol moieties via silylation, along with an activating agent such as an amine, an onium compound, or an alkali metal hydroxide. Another notable patent addresses the repair and restoration of damaged dielectric materials and films. This method outlines a process for repairing voids in materials by utilizing reactive silanol groups and surface modification agents. Additionally, Naman has developed methods for carbon restoration in materials, which also leverage reactive silanol groups. His work further includes techniques for reducing condensation in films through plasma treatment and the introduction of reactive organic moieties.
Career Highlights
Ananth Naman is currently employed at Honeywell International Inc., where he continues to push the boundaries of innovation in dielectric materials. His expertise and dedication to research have positioned him as a key player in the industry.
Collaborations
Naman has collaborated with notable colleagues such as Paul G. Apen and Nancy E. Iwamoto, contributing to a dynamic research environment that fosters innovation and development.
Conclusion
Ananth Naman's work in dielectric materials exemplifies the impact of innovative thinking in technology. His patents not only advance the field but also pave the way for future developments in material science.