The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2013

Filed:

Sep. 15, 2004
Applicants:

Teresa A. Ramos, San Jose, CA (US);

Robert R. Roth, Sunnyvale, CA (US);

Anil S. Bhanap, Milpitas, CA (US);

Paul G. Apen, San Francisco, CA (US);

Denis H. Endisch, Cupertino, CA (US);

Brian J. Daniels, La Honda, CA (US);

Ananth Naman, San Jose, CA (US);

Nancy Iwamoto, Ramona, CA (US);

Roger Y. Leung, San Jose, CA (US);

Inventors:

Teresa A. Ramos, San Jose, CA (US);

Robert R. Roth, Sunnyvale, CA (US);

Anil S. Bhanap, Milpitas, CA (US);

Paul G. Apen, San Francisco, CA (US);

Denis H. Endisch, Cupertino, CA (US);

Brian J. Daniels, La Honda, CA (US);

Ananth Naman, San Jose, CA (US);

Nancy Iwamoto, Ramona, CA (US);

Roger Y. Leung, San Jose, CA (US);

Assignee:

Honeywell International Inc., Morristown, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A toughening agent composition for increasing the hydrophobicity of an organosilicate glass dielectric film when applied to said film. It includes a component capable of alkylating or arylating silanol moieties of the organosilicate glass dielectric film via silylation, and an activating agent selected from the group consisting of an amine, an onium compound and an alkali metal hydroxide.


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