Company Filing History:
Years Active: 2007
Title: Innovation in Electroplating: The Patented Work of Anand Durairajan
Introduction
Anand Durairajan, an inventive mind residing in Tigard, Oregon, has contributed to the field of electroplating through his innovative patent. His invention represents a significant advancement in the efficiency and effectiveness of electroplating processes.
Latest Patents
The focus of Anand's patent is an "Apparatus having plating solution container with current applying anodes." This innovative method for an electroplating cell includes a design featuring at least two concentric anodes, comprising an inner and an outer anode. The process employs a computer-generated model that utilizes simulation software to identify and optimize various current ratios between the two anodes. By selectively applying inner and outer electrical currents according to the identified ratios, Anand’s invention allows for precise control of the electroplating process, which is critical for high-quality outcomes.
Career Highlights
Anand has established his career within Intel Corporation, a leading player in the technology sector. His work at Intel highlights his commitment to innovation and ongoing contributions to advancements in the semiconductor industry. His one patent signifies his potential to drive further technological improvements within his field.
Collaborations
During his time at Intel, Anand has collaborated with notable colleagues such as Radek P. Chalupa and Harsono S. Simka. These collaborations not only enhance the innovation ecosystem within Intel but also pave the way for collective advancements in technology.
Conclusion
Anand Durairajan's innovative contributions, encapsulated in his patent for an electroplating apparatus, exemplify the important strides being made in electroplating technology. Through his work at Intel Corporation and his collaborations with fellow engineers, Anand continues to push the boundaries of innovation, showcasing the integral role inventors play in shaping the future of technology.