This inventor holds 1 USPTO granted patent. Top assignee: Université´de Rouen. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: Anais Lafontaine: Innovator in X-ray Scattering Measurement
Introduction
Anais Lafontaine is a prominent inventor based in Rouen, France. She has made significant contributions to the field of X-ray analysis through her innovative methods and devices. Her work focuses on enhancing the accuracy and efficiency of measuring the scattering of X-rays.
Latest Patents
Anais Lafontaine holds a patent for a method of measuring the scattering of X-rays, along with its applications and implementation device. The invention involves a unique approach where the compound to be analyzed is placed in a receptacle with an X-ray-permeable flat bottom. The X-ray diffraction analysis is conducted by directing an X-ray stream upwards towards the bottom and measuring the scattered X-rays that are reflected downwards. Additionally, a fluid that is thermostatically controlled to match the temperature of the compound is projected towards the X-ray permeable bottom from outside the receptacle. This innovative method enhances the precision of X-ray scattering measurements.
Career Highlights
Anais Lafontaine is affiliated with the University of Rouen, where she continues to advance her research and development in the field of X-ray analysis. Her dedication to innovation has positioned her as a key figure in her area of expertise.
Collaborations
Anais has collaborated with notable colleagues, including Gerard Coquerel and Morgane Sanselme. These partnerships have contributed to the advancement of her research and the successful implementation of her patented methods.
Conclusion
Anais Lafontaine's contributions to the field of X-ray scattering measurement exemplify her innovative spirit and dedication to scientific advancement. Her patented method represents a significant step forward in the accuracy of X-ray analysis.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
