An-Shih Shih

Title: **Innovator An-Shih Shih: Pioneering FinFET Technology**

Introduction

An-Shih Shih is a notable inventor based in Taoyuan, Taiwan, whose work significantly contributes to advancements in semiconductor technology. With a patent portfolio comprising two notable innovations, Shih's expertise lies particularly in the fabrication methods of fin structures that enhance electronic performance.

Latest Patents

An-Shih Shih's latest patents focus on the innovative **Fabricating method of fin structure with tensile stress** and **complementary FinFET structure**. This advanced method involves creating a structure partitioned into N-type and P-type transistor regions. The process begins with the formation of two first trenches that delineate the fin structure, coupled with two additional second trenches that segment these first trenches and the fin itself. By utilizing flowable chemical vapor deposition, Shih's method ensures the formation of a silicon oxide layer that fills both trench types. A distinctive patterned mask is employed solely within the N-type region, allowing for controlled removal of part of the silicon oxide layer to achieve a fin structure that is more efficient and responsive. This innovative approach contributes to enhanced electronic performance.

Career Highlights

Throughout his career at United Microelectronics Corporation, An-Shih Shih has been at the forefront of semiconductor innovations. His work not only demonstrates a commitment to advancing fabrication techniques but also highlights his role in driving the development of FinFET technologies essential for modern electronics. His patents mark significant contributions to the industry's evolving landscape, showcasing his skills and dedication.

Collaborations

In his professional journey, An-Shih Shih collaborates with esteemed colleagues, including Kai-Lin Lee and Zhi-Cheng Lee, strengthening the innovative capabilities at United Microelectronics Corporation. These collaborations foster an environment of creativity and technological advancement, further propelling the organization’s mission to enhance semiconductor manufacturing processes.

Conclusion

An-Shih Shih's contributions to semiconductor technology through his patents reflect his innovative spirit and technical acumen. With a focus on enhancing fabrication methods, his work paves the way for future advancements in the industry. As he continues to develop groundbreaking solutions in collaboration with talented colleagues, Shih remains an influential figure in the realm of electronics and innovation.