An-Chi Li

Title: An-Chi Li: Innovator in Wafer Uniformity Control

Introduction

An-Chi Li is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of wafer uniformity control. With a total of five patents to his name, Li's work has advanced the technology used in plasma-based processes.

Latest Patents

Li's latest patents include innovative devices and methods for controlling wafer uniformity. One notable patent is for a baffle plate designed to control plasma distribution on a wafer. This device features a housing that defines a process chamber, with a baffle plate positioned above the wafer. The baffle plate is uniquely shaped as an annulus, consisting of two sectors with different inner radii, allowing for precise control of plasma distribution. Another patent focuses on a gas distribution plate (GDP) that is integral to the process chamber. This GDP is equipped with multiple holes for even gas distribution and includes zones that enhance the efficiency of the plasma-based processes.

Career Highlights

An-Chi Li is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor industry. His work at this esteemed company has positioned him as a key player in the development of advanced manufacturing techniques. His patents reflect his commitment to innovation and excellence in semiconductor technology.

Collaborations

Throughout his career, Li has collaborated with