Liverpool, United Kingdom

Amos C Dexter

This inventor holds 1 USPTO granted patent. Top assignee: The Electricity Council. Active years: 1990.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: The Innovations of Amos C. Dexter

Introduction

Amos C. Dexter is a notable inventor based in Liverpool, GB. He has made significant contributions to the field of thermochemical treatment, particularly through his innovative patent. His work is recognized for addressing challenges in plasma case hardening techniques.

Latest Patents

Amos C. Dexter holds a patent for a "Method and apparatus for thermochemical treatment." This invention focuses on improving the known techniques of plasma case hardening of workpieces. The patent highlights that traditional methods may fail to adequately treat re-entrant portions, such as fine holes, in the workpiece. Dexter's technique involves pulsed plasma treatment, where the duration of the plasma pulses and the intervals between them are carefully selected. This approach allows for a substantially even distribution of the gas that forms the plasma over the entire surface of the workpiece being treated.

Career Highlights

Amos C. Dexter is associated with The Electricity Council, where he applies his expertise in thermochemical treatments. His work has contributed to advancements in the field, showcasing his commitment to innovation and improvement in industrial processes.

Collaborations

Some of his notable coworkers include Michael I. Lees and Barry J. Taylor. Their collaboration has likely fostered an environment of innovation and shared expertise in their respective fields.

Conclusion

Amos C. Dexter's contributions to thermochemical treatment through his patent demonstrate his innovative spirit and dedication to solving complex engineering challenges. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
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