The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 1990

Filed:

Oct. 16, 1987
Applicant:
Inventors:

Amos C Dexter, Liverpool, GB;

Michael I Lees, Tarvin, GB;

Barry J Taylor, Mold, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21D / ;
U.S. Cl.
CPC ...
148 203 ; 148 165 ; 204164 ; 266251 ;
Abstract

Known techniques of plasma case hardening of workpieces may fail to provide sufficient treatment to re-entrant portions, such as fine holes, in the workpiece. This specification discloses a technique of pulsed plasma treatment in which the duration of the plasma pulses and the intervals between them are selected to allow a substantially even distribution of the gas which forms the plasma over all the surface to be treated of the workpiece.


Find Patent Forward Citations

Dexter, Amos. (1990). Method and apparatus for thermochemical treatment (U.S. Patent No. 4900371). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4900371

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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