Portland, OR, United States of America

Allen Daniel Feller

This inventor holds 4 USPTO granted patents. Top assignee: Intel Corporation. Active years: 1995-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Allen Daniel Feller. Retrieved from https://idiyas.com/inventor/allen-daniel-feller

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 87(Granted Patents)


Company Filing History:


Years Active: 1995-2010

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4 patents (USPTO):Explore Patents

Title: Allen Daniel Feller: Innovator in Chemical Mechanical Polishing

Introduction

Allen Daniel Feller is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of slurries used for polishing aluminum substrates. With a total of 4 patents to his name, Feller's work has had a substantial impact on the industry.

Latest Patents

Feller's latest patents include a slurry for chemical mechanical polishing of aluminum. This invention describes a slurry that is specifically designed for polishing substrates made of aluminum or aluminum alloys, featuring widths of less than 1 um. The slurry incorporates a precipitated silica abrasive with a diameter of less than or equal to 100 nm, along with a chelating buffer system that includes citric acid and oxalic acid, maintaining a pH range of approximately 1.5 to 4.0. Another significant patent is a method for improving chemical mechanical polish endpoint signals through the use of chemical additives. This method buffers the chemical slurry, reducing the buildup of local acidic areas at the interface between the polished metal and the polishing pad, thereby enhancing the uniformity of the polish and the endpoint signal used to determine when to finish the polishing operation.

Career Highlights

Allen Daniel Feller is currently employed at Intel Corporation, where he continues to innovate and contribute to advancements in chemical mechanical polishing technologies. His work at Intel has positioned him as a key player in the development of effective polishing solutions.

Collaborations

Feller has collaborated with notable coworkers, including Kenneth C Cadien and Donald D Danielson. These collaborations have further enriched his work and contributed to the success of his inventions.

Conclusion

Allen Daniel Feller is a distinguished inventor whose contributions to chemical mechanical polishing have made a lasting impact on the industry. His innovative patents and work at Intel Corporation highlight his commitment to advancing technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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