Allan O Cruz

Title: Innovations of Allan O Cruz in Semiconductor Fabrication

Introduction

Allan O Cruz is a notable inventor based in Colchester, Vermont, who has made significant contributions to the field of semiconductor fabrication. With a focus on optimizing technology pattern density requirements, his work has implications for the efficiency and effectiveness of integrated circuit design.

Latest Patents

Allan holds a patent titled "Methods and systems to meet technology pattern density requirements of semiconductor fabrication processes." This patent outlines techniques, systems, and methods for optimizing pattern density fill patterns for integrated circuits. The method involves adjusting the area of a scribe line and the density of dummy fill shapes within the adjusted scribe line, while maintaining the area of the die. This approach aims to achieve a pattern density that aligns with the technology ground rules for specific die designs. Allan has 1 patent to his name.

Career Highlights

Allan O Cruz is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to work at the forefront of technological advancements in semiconductor processes, contributing to the company's reputation as a leader in innovation.

Collaborations

Throughout his career, Allan has collaborated with talented individuals such as Jeanne P Bickford and Michelle Gill. These collaborations have likely enriched his work and contributed to the development of innovative solutions in the semiconductor industry.

Conclusion

Allan O Cruz's contributions to semiconductor fabrication through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work not only enhances the efficiency of integrated circuits but also reflects the collaborative spirit of innovation at IBM.