Allan L Sagle

Title: The Innovative Contributions of Allan L Sagle

Introduction

Allan L Sagle is a notable inventor based in Berkeley, CA, with a significant impact in the field of imaging and lithography. He holds a total of 4 patents, showcasing his innovative spirit and technical expertise. His work has contributed to advancements in dynamic imaging systems and electron beam lithography.

Latest Patents

One of Sagle's latest patents is a method and apparatus for a dynamic space-time imaging system. This invention involves creating a 3D map of the surface contours of an object by projecting various patterns onto it. The patterns are imaged as they fall on the object, encoding its topographic features. In one embodiment, a three-dimensional image is captured in a single flash to prevent blurring caused by motion. A secondary pattern is then projected to detect changes in the initial image, allowing for the detection of motional variations such as a breathing human or the flexure of complex mechanical structures.

Another significant patent is for a multiple electron beam lithography system with modulated laser illumination. This system includes a laser that generates a beam, which is then split into multiple light beams. Each beam's intensity is individually modulated, and when these beams impinge on a photocathode, electrons are emitted. The modulation of the light beams controls the resulting electron beams, which are focused and scanned to write on a surface using an interlaced writing strategy.

Career Highlights

Throughout his career, Allan L Sagle has worked with prominent companies such as Etec Systems, Inc. and Applied Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in his field.

Collaborations

Sagle has collaborated with notable individuals in the industry, including Lee H Veneklasen and Marian Mankos. These collaborations have likely enriched his work and led to further innovations.

Conclusion

Allan L Sagle's contributions to the fields of imaging and lithography are significant, with his patents reflecting a deep understanding of technology and innovation. His work continues to influence advancements in these areas, showcasing the importance of inventors in driving progress.