The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Jan. 22, 2002
Marian Mankos, San Francisco, CA (US);
Steven T. Coyle, Alameda, CA (US);
Andres Fernandez, Dublin, CA (US);
Allan L. Sagle, Berkeley, CA (US);
Paul C. Allen, Beaverton, OR (US);
Xiaolan Chen, Beaverton, OR (US);
Douglas Holmgren, Portland, OR (US);
Windsor Owens, San Francisco, CA (US);
Jeffrey Sullivan, Berkeley, CA (US);
Tim Thomas, Portland, OR (US);
Mark A. Gesley, Oakland, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile