This inventor holds 2 USPTO granted patents. Top assignees: Rca Inc., Western Electric Company, Inc.. Active years: 1977-1981.
Company Filing History:
Years Active: 1977-1981
Title: Aline Akselrad: Innovator in Dielectric Films and Garnet Technologies
Introduction
Aline Akselrad is a notable inventor based in Princeton, NJ (US). She has made significant contributions to the field of materials science, particularly in the development of dielectric films and garnet technologies. With a total of 2 patents, her work has had a lasting impact on various technological applications.
Latest Patents
Aline Akselrad's latest patents include a method of depositing uniform films of Si.sub.x N.sub.y and a composition for making garnet films for improved magnetic bubble devices. The first patent describes a process for depositing a uniform dielectric film on a silicon substrate. This involves flowing a plasma mixture of an inert gas, such as argon, and silane over the substrate to create a film of porous a-Si.sub.x H.sub.y. The process continues with a substitution of nitrogen or oxygen plasma, followed by an increase in substrate temperature to diffuse out hydrogen, resulting in the desired dielectric film. The second patent focuses on garnet films that are suitable for bubble devices, which are enhanced with bismuth, aluminum, or gallium and certain rare earth ions. These films exhibit improved magneto-optic properties and can be formed at low temperatures on gadolinium gallium garnet substrates.
Career Highlights
Throughout her career, Aline has worked with prominent companies such as Western Electric Company, Inc. and RCA Inc. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking innovations in her field.
Collaborations
Aline Akselrad has collaborated with Richard Edwin Novak, further enhancing her research and development efforts in the industry.
Conclusion
Aline Akselrad's contributions to the fields of dielectric films and garnet technologies demonstrate her innovative spirit and dedication to advancing materials science. Her patents reflect her expertise and commitment to creating impactful solutions in technology.