Alina Nicoleta Tarau

Title: Alina Nicoleta Tarau and Lithographic Performance Qualification

Introduction

Alina Nicoleta Tarau is an inventor based in Waalre, the Netherlands. Her listed patent work concerns lithographic performance qualification and associated apparatuses. She is associated with ASML Netherlands B.V.

Latest Patents

Tarau is credited with 1 patent: “Lithographic Performance Qualification and Associated Apparatuses.” The invention describes a method for testing lithographic performance by obtaining exposure layouts and performing dummy exposures on photoresist-coated substrates. During each dummy exposure, the method monitors exposure parameters and uses the resulting data to evaluate the performance of the exposure and its corresponding layout. The dummy exposure uses no illumination or illumination below the photoresist’s exposure threshold.

Career Highlights

The available information identifies Tarau’s work in lithography, a field central to semiconductor manufacturing. Her patent focuses on evaluating exposure processes and layouts through monitored dummy exposures.

Collaborations

Tarau’s listed coworker is Robert Bastiaan Clark De Korte. The available details do not specify the nature of their collaboration.

Conclusion

Alina Nicoleta Tarau’s listed patent addresses a method for assessing lithographic performance, reflecting her association with semiconductor manufacturing technology at ASML Netherlands B.V.