Company Filing History:
Years Active: 2001
Title: The Innovative Contributions of Alice Chao
Introduction
Alice Chao is a prominent inventor based in Hsinchu, Taiwan. She has made significant contributions to the field of semiconductor technology, particularly in the fabrication of metal oxide semiconductor (MOS) transistors. Her innovative methods have paved the way for advancements in electronic devices.
Latest Patents
Alice Chao holds 1 patent for her invention titled "Method of fabricating a MOS transistor with local channel ion implantation regions." This patent describes a fabrication method that involves forming gate oxide layers of varying thicknesses on core and input/output (I/O) regions. The process includes creating wells in the substrate and forming implantation regions to adjust the threshold voltage and provide an anti-punch through layer. The method utilizes a pattern mask to facilitate ion implantation, ensuring precision in the fabrication of MOS transistors.
Career Highlights
Alice Chao is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. Her work has been instrumental in enhancing the performance and efficiency of MOS transistors, which are critical components in modern electronic devices.
Collaborations
Alice has collaborated with notable colleagues, including Tony Lin and Jih-Wen Chou. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.
Conclusion
Alice Chao's contributions to semiconductor technology exemplify the impact of innovative thinking in the industry. Her patent and collaborative efforts continue to influence advancements in electronic device fabrication.