For the Inventor, By the Inventor

Enter inventor name

Hong Kong, China

Alfred K Wong

USPTO Granted Patents = 13 (Patent Applications = 1)

Average Co-Inventor Count = 3.1

ph-index = 11

Forward Citations = 892(Granted Patents)

Location History:

Beacon, NY (US) (1999 - 2003)
Hong Kong, CN (2003)

Company Filing History:

11 out of 164,197

International Business Machines Corporation

2 out of 832,843

Other

patents

Years Active: 1999-2003

Loading Chart...

13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6602728 - Method for generating a proximity model based on proximity rules (2003-08-05),

2. 6596442 - Asymmetric halftone biasing for sub-grid pattern adjustment (2003-07-22),

3. 6578190 - Process window based optical proximity correction of lithographic images (2003-06-10),

4. 6553559 - Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions (2003-04-22),

5. 6541166 - Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures (2003-04-01),

6. 6525818 - Overlay alignment system using polarization schemes (2003-02-25),

7. 6511791 - Multiple exposure process for formation of dense rectangular arrays (2003-01-28),

8. 6338922 - Optimized alternating phase shifted mask design (2002-01-15),

9. 6327033 - Detection of phase defects on photomasks by differential imaging (2001-12-04),

10. 6223139 - Kernel-based fast aerial image computation for a large scale design of integrated circuit patterns (2001-04-24),

11. 6057063 - Phase shifted mask design system, phase shifted mask and VLSI circuit (2000-05-02),

12. 5965306 - Method of determining the printability of photomask defects (1999-10-12),

13. 5932377 - Exact transmission balanced alternating phase-shifting mask for (1999-08-03),

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Loading…