Alfred K Wong

Title: Alfred K Wong: Innovator in Optical Proximity Correction

Introduction

Alfred K Wong is a prominent inventor based in Hong Kong, CN. He holds a total of 13 patents that showcase his expertise in optical proximity correction and related technologies. His innovative contributions have significantly impacted the field of semiconductor manufacturing.

Latest Patents

One of Wong's latest patents is titled "Method for generating a proximity model based on proximity rules." This method involves generating a set of correction rules for a wafer design that includes lines and assist features. It determines the necessary corrections over a range of sizes and spaces, ultimately creating an optical proximity correction model to enhance wafer designs. Another notable patent is "Asymmetric halftone biasing for sub-grid pattern adjustment." This technique allows for controlling feature dimensions in printed images at increments smaller than the smallest addressable unit of the template. It involves fabricating photomasks that yield images with sizes differing from a nominal width by small fractions of the minimum template size.

Career Highlights

Throughout his career, Alfred K Wong has worked with notable companies, including International Business Machines Corporation (IBM). His work at IBM has allowed him to develop and refine his innovative techniques in optical proximity correction.

Collaborations

Wong has collaborated with esteemed colleagues such as Lars W Liebmann and Richard A Ferguson. These collaborations have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Alfred K Wong's contributions to optical proximity correction and his innovative patents have established him as a key figure in the field. His work continues to influence advancements in semiconductor manufacturing and related technologies.