This inventor holds 3 USPTO granted patents. Top assignee: Leybold Aktiengesellschaft. Active years: 1990-1993.
Company Filing History:
Years Active: 1990-1993
Title: Alfons Hausler: Innovator in Plasma Technology
Introduction
Alfons Hausler is a notable inventor based in Obertshausen, Germany. He has made significant contributions to the field of plasma technology, holding a total of 3 patents. His work focuses on innovative methods and materials that enhance the efficiency and effectiveness of various applications.
Latest Patents
Hausler's latest patents include a rotating magnetron cathode and a method for its use. This invention features a tubular target equipped with a magnet system designed to create a first plasma for coating planar substrates through a cathode sputtering process. Additionally, he has developed an optical recording medium for audio-video or ROM compact discs. This medium consists of a pitted translucent base material and a layer of corrosion-resistant metals, such as tantalum and chromium, which provide excellent adhesion and reflectivity without the need for further protective coatings.
Career Highlights
Alfons Hausler is currently associated with Leybold Aktiengesellschaft, a company known for its advancements in vacuum technology and coating solutions. His work has been instrumental in pushing the boundaries of what is possible in the field of plasma applications.
Collaborations
Throughout his career, Hausler has collaborated with esteemed colleagues, including Rainer Ludwig and Michael Jung. These partnerships have fostered innovation and have contributed to the successful development of his patented technologies.
Conclusion
Alfons Hausler's contributions to plasma technology and his innovative patents reflect his dedication to advancing the field. His work continues to influence various applications, showcasing the importance of innovation in technology.