San Jose, CA, United States of America

Alexandre Matveev

This inventor holds 2 USPTO granted patents. Top assignee: Cadence Design Systems, Inc.. Active years: 2008-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alexandre Matveev. Retrieved from https://idiyas.com/inventor/alexandre-matveev

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 9.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2008-2012

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations by Alexandre Matveev

Introduction

Alexandre Matveev is a notable inventor based in San Jose, CA. He has made significant contributions to the field of electronic design automation (EDA) through his innovative patents. With a total of 2 patents, Matveev's work focuses on improving wiring models for EDA tools.

Latest Patents

Matveev's latest patents include the "Local Preferred Direction Architecture" and "Local Preferred Direction Architecture, Tools, and Apparatus." These inventions provide a Local Preferred Direction (LPD) wiring model that allows for multiple regions within a wiring layer to have different preferred directions. This model enhances the efficiency of EDA tools by allowing for a more flexible design layout. Additionally, the patents feature a Graphical User Interface (GUI) that aids in the visual presentation and manipulation of LPD regions.

Career Highlights

Currently, Matveev is employed at Cadence Design Systems, Inc., where he continues to develop innovative solutions in the EDA space. His work has been instrumental in advancing the capabilities of design tools used in the industry.

Collaborations

Matveev collaborates with talented individuals such as Asmus Hetzel and Anish Malhotra, contributing to a dynamic work environment that fosters innovation.

Conclusion

Alexandre Matveev's contributions to the field of electronic design automation through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…