Ulm, Germany

Alexander Weigl

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 4(Granted Patents)


Location History:

  • Bubesheim, DE (2017)
  • Eindhoven, NL (2019)
  • Ulm, DE (2018 - 2024)

Company Filing History:


Years Active: 2017-2024

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5 patents (USPTO):Explore Patents

Title: Innovations of Alexander Weigl

Introduction

Alexander Weigl is a notable inventor based in Ulm, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on methods that enhance the performance and efficiency of laser devices.

Latest Patents

Among his latest patents is a method of forming an electrical metal contact within a semiconductor layer stack of a vertical cavity surface emitting laser. This method involves creating a contact hole in the semiconductor layer stack, providing a photoresist mask, and performing wet-chemical isotropic etching. The process culminates in the deposition of metal, which serves as the electrical metal contact. Another significant patent describes a compact laser device that includes multiple mesas on a single semiconductor chip. This design allows for improved yield and performance while maintaining a manageable size for the semiconductor chip.

Career Highlights

Throughout his career, Alexander Weigl has worked with prominent companies such as Koninklijke Philips Corporation N.V. and Trumpf Photonic Components GmbH. His experience in these organizations has contributed to his expertise in semiconductor technologies and laser devices.

Collaborations

He has collaborated with notable coworkers, including Philipp Henning Gerlach and Holger Joachim Moench. Their combined efforts have further advanced the innovations in the field of laser technology.

Conclusion

Alexander Weigl's contributions to semiconductor technology and laser devices highlight his role as a significant inventor in the industry. His patents reflect a commitment to innovation and improvement in the field.

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