Andover, United Kingdom

Alexander Phillip Robinson

This inventor holds 2 USPTO granted patents. Top assignees: Japan as Represented by Director of Agency of Industrial Science and, The University of Birmingham, Other. Active years: 2000-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alexander Phillip Robinson. Retrieved from https://idiyas.com/inventor/alexander-phillip-robinson

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2000-2003

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2 patents (USPTO):Explore Patents

Title: Alexander Phillip Robinson: Innovator in Electron Beam Resist Technology

Introduction

Alexander Phillip Robinson is a notable inventor based in Andover, GB. He has made significant contributions to the field of semiconductor manufacturing through his innovative work in electron beam resist technology. With a total of 2 patents, Robinson's inventions have advanced the methods used in fine patterning for semiconductor devices.

Latest Patents

Robinson's latest patents include a high-resolution patterning method utilizing electron beam resist. The first patent describes a method involving the patternwise irradiation of a resist layer with electron beams, using a polysubstituted triphenylene compound. This method enhances the solubility of the resist material in polar solvents, making it highly resistant to dry etching, which is crucial for semiconductor device manufacturing. The second patent focuses on a similar high-resolution patterning method, but it employs a methanofullerene compound as the electron beam resist material. This innovation also ensures the resist layer's resistance against dry etching, further supporting its application in fine patterning work.

Career Highlights

Throughout his career, Robinson has worked with prominent organizations, including the Japan Agency of Industrial Science and Technology and the University of Birmingham. His experience in these institutions has allowed him to refine his expertise in semiconductor technologies and contribute to groundbreaking research.

Collaborations

Robinson has collaborated with esteemed colleagues such as Toshihiko Kanayama and Tetsuya Tada. These partnerships have fostered a collaborative environment that has led to significant advancements in the field of electron beam resist technology.

Conclusion

Alexander Phillip Robinson's contributions to electron beam resist technology have positioned him as a key figure in the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing manufacturing techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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