This inventor holds 1 USPTO granted patent. Top assignee: Kla Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Alexander Novikov: Innovator in Metrology Systems
Introduction
Alexander Novikov is a prominent inventor based in Milpitas, CA (US). He has made significant contributions to the field of metrology, particularly with his innovative patent that enhances measurement systems. His work is characterized by a focus on precision and efficiency in imaging systems.
Latest Patents
One of Novikov's notable patents is titled "Extra tall target metrology." This metrology system includes an imaging system that may feature an objective lens. The system is designed with one or more detectors and an objective positioning stage that is structurally coupled to the objective lens. This stage is configured to adjust the focal plane of the detectors through movement along the optical axis. Additionally, the system incorporates proximity sensors that measure the lateral positions of a stage element as the objective positioning stage moves. The metrology system is capable of determining measurements associated with a target on a sample by utilizing images and lateral positions when implementing a metrology recipe. Novikov holds 1 patent in this area.
Career Highlights
Alexander Novikov is currently associated with Kla Corporation, where he applies his expertise in metrology systems. His role involves developing advanced technologies that improve measurement accuracy and reliability. His innovative approach has positioned him as a key figure in his field.
Collaborations
Novikov has worked alongside talented colleagues such as Yoram Uziel and Ariel Hildesheim. Their collaborative efforts contribute to the advancement of metrology technologies and enhance the capabilities of their projects.
Conclusion
Alexander Novikov is a distinguished inventor whose work in metrology systems has made a significant impact on the industry. His innovative patent and collaboration with skilled professionals highlight his commitment to advancing measurement technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
