Eindhoven, Netherlands

Alex Thomas Van Der Plaat

This inventor holds 1 USPTO granted patent. Top assignee: O.d.m.e. International B.v.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alex Thomas Van Der Plaat. Retrieved from https://idiyas.com/inventor/alex-thomas-van-der-plaat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Alex Thomas Van Der Plaat: Innovator in Optical Disk Manufacturing

Introduction

Alex Thomas Van Der Plaat is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of optical disk manufacturing. His innovative methods have paved the way for advancements in this technology.

Latest Patents

Van Der Plaat holds a patent for a method of manufacturing a matrix for producing optical disks. This invention involves applying a photoresist film to an unstructured matrix plate and structuring the film through selective exposure and development. The process allows for the creation of high-quality optical disks, enhancing their production efficiency.

Career Highlights

He is currently associated with O.D.M.E. International B.V., where he continues to develop and refine his innovative techniques. His work has been instrumental in advancing the manufacturing processes within the optical disk industry.

Collaborations

One of his notable coworkers is Maria Elizabeth Reuhman-Huisken. Together, they contribute to the ongoing research and development efforts at their company.

Conclusion

Alex Thomas Van Der Plaat's contributions to optical disk manufacturing exemplify the spirit of innovation. His patent reflects a deep understanding of the complexities involved in this technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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