Company Filing History:
Years Active: 2008
Title: Alex J Schrinksy: Innovator in Semiconductor Technology
Introduction
Alex J Schrinksy is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on improving the fabrication processes of semiconductor devices, which are essential in modern electronics.
Latest Patents
Schrinksy holds a patent for a "Dry etching process to form a conductive layer within an opening without use of a mask during the formation of a semiconductor device." This method involves forming a conformal conductive layer over a planarized surface of a dielectric layer and within an opening formed in the dielectric layer. The process is designed to achieve high aspect ratios, typically around 4:1 or greater. The etching is performed using specified gases under controlled conditions, allowing for the removal of the conductive layer from the planarized surface while preserving it within the opening.
Career Highlights
Alex J Schrinksy is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His work at Micron has allowed him to apply his innovative ideas and contribute to advancements in semiconductor manufacturing.
Collaborations
One of Schrinksy's notable coworkers is Mark E Jost, with whom he collaborates on various projects within the company. Their combined expertise enhances the innovative capabilities of their team.
Conclusion
Alex J Schrinksy is a prominent figure in the semiconductor industry, recognized for his innovative patent and contributions to technology. His work continues to influence the development of advanced semiconductor devices.