Albert J Gregoritsch, Iii

Title: The Innovations of Albert J. Gregoritsch, III

Introduction

Albert J. Gregoritsch, III is a notable inventor based in Jericho, Vermont, known for his contributions to the field of technology. He holds 2 patents and has made significant advancements in the design and functionality of shadow masks used in semiconductor manufacturing.

Latest Patents

One of his latest patents is focused on a wafer integrated rigid support ring. This innovative shadow mask for depositing solder bumps includes additional dummy holes located adjacent to holes corresponding to most of the perimeter chips of the wafer. The additional dummy holes provide more uniform plasma etching of contacts of the wafer, improve etching of contacts of perimeter chips, and lower contact resistance of these contacts. Furthermore, the extra holes allow for solder bumps outside the perimeter chips, which can be utilized to support a second shadow mask for the deposition of additional materials, such as tin, on the reflowed solder bumps. This process is essential for mounting the chips on a plastic substrate at low temperatures. An improved mask-to-wafer alignment aid is also formed from standard solder bumps, which avoids damage to test probes and enhances course alignment.

Career Highlights

Albert J. Gregoritsch, III is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop innovative solutions that enhance semiconductor manufacturing processes.

Collaborations

Throughout his career, Albert has collaborated with notable coworkers, including Harry David Cox and David P. Daniel. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Albert J. Gregoritsch, III is a distinguished inventor whose work has significantly impacted the technology sector. His innovative patents and contributions to IBM highlight his dedication to advancing semiconductor manufacturing processes.