Company Filing History:
Years Active: 2017
Title: Alan M Meyers: Innovator in Metal Reliability
Introduction
Alan M Meyers is a notable inventor based in Beaverton, OR (US). He has made significant contributions to the field of integrated circuits, particularly in enhancing metal reliability. His innovative techniques focus on reducing electromigration in metal lines, which is crucial for the longevity and performance of electronic devices.
Latest Patents
Alan holds a patent for "Forming barrier walls, capping, or alloys/compounds within metal lines." This patent describes techniques and structures related to treating copper to form alloys or compounds. These advancements aim to reduce electromigration and strengthen the reliability of metal as the length of lines increases in integrated circuits. He has 1 patent to his name.
Career Highlights
Alan is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has positioned him at the forefront of research and development in the electronics industry.
Collaborations
Throughout his career, Alan has collaborated with talented individuals such as Christopher J Jezewski and Kanwal Jit Singh. These collaborations have furthered advancements in the field and contributed to the success of their projects.
Conclusion
Alan M Meyers is a distinguished inventor whose work has significantly impacted the reliability of metal in integrated circuits. His innovative approaches continue to shape the future of technology.