Loveland, CO, United States of America

Alan Lee Holesovsky


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2006-2009

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2 patents (USPTO):Explore Patents

Title: Alan Lee Holesovsky: Innovator in Integrated Circuit Design

Introduction

Alan Lee Holesovsky is a notable inventor based in Loveland, Colorado. He has made significant contributions to the field of integrated circuit design, holding 2 patents that showcase his innovative approaches to design validation.

Latest Patents

Holesovsky's latest patents include a "Method and system for layout versus schematic validation of integrated circuit designs." This patent describes a method for validating selected layers of an integrated circuit design, where a rundeck is edited to include IC layers and device structures that may require validation. The process involves performing a layout versus schematic (LVS) comparison using the edited rundeck, resulting in an error report. Another significant patent is the "Method of early physical design validation and identification of texted metal short circuits in an integrated circuit design." This invention outlines a method and computer program product for early physical design validation, which includes steps for receiving input representations of an integrated circuit design and generating a specific rule deck for validation.

Career Highlights

Throughout his career, Alan has worked with prominent companies such as LSI Logic Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in integrated circuit technology.

Collaborations

Holesovsky has collaborated with notable professionals in the field, including Viswanathan Lakshmanan and Lisa M. Miller. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Alan Lee Holesovsky is a distinguished inventor whose work in integrated circuit design has led to valuable patents and innovations. His contributions continue to influence the industry and inspire future advancements.

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