New Orleans, LA, United States of America

Alan Harry Katz


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Alan Harry Katz: Innovator in Two-Phase CCD Technology

Introduction

Alan Harry Katz is a notable inventor based in New Orleans, Louisiana. He is recognized for his contributions to the field of electronics, particularly in the development of charge-coupled devices (CCDs). His innovative work has led to the creation of a significant patent that enhances the functionality of CCD structures.

Latest Patents

Katz holds a patent for a "Two-phase CCD regenerator," which focuses on I/O circuits and insulated gate field effect transistor charge regenerator amplifiers. This invention cross-couples the output regions of a pair of two-phase CCD structures with their input regions. Each amplifier in this system senses the level of binary data charge packets from one shift register structure and applies a regenerated and inverted binary data charge packet to the input region of another structure. The design includes logic gating for efficient data input and output, making it a crucial advancement in CCD technology.

Career Highlights

Alan Harry Katz has made significant strides in his career, working with Texas Instruments Corporation, a leading company in the electronics industry. His expertise in CCD technology has positioned him as a valuable asset within the organization. Katz's innovative approach has contributed to the advancement of electronic devices that rely on CCD technology.

Collaborations

Throughout his career, Katz has collaborated with notable colleagues, including Robert C Frye and Charles Robert Hewes. These partnerships have fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Alan Harry Katz is a distinguished inventor whose work in two-phase CCD technology has made a lasting impact on the electronics industry. His patent and collaborations reflect his commitment to innovation and excellence in engineering.

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