Alan C Janos

Title: Alan C Janos: Innovator in Plasma Technology

Introduction

Alan C Janos is a notable inventor based in East Windsor, NJ (US). He has made significant contributions to the field of plasma technology, holding a total of 3 patents. His work focuses on innovative solutions that enhance the efficiency and effectiveness of plasma processing systems.

Latest Patents

Among his latest patents is the "Double window exhaust arrangement for wafer plasma processor." This invention features a plasma ashing chamber that utilizes an external radiant power source to uniformly heat the wafer. The design incorporates a double plate window that allows radiant heat and exhaust gases to flow without interfering with each other. Another significant patent is the "Spheromak reactor with poloidal flux-amplifying transformer." This invention involves an inductive transformer that induces poloidal flux along a flux core's axis, facilitating the generation and maintenance of spheromak plasma. The transformer approach improves the efficiency of poloidal flux injection and reduces plasma contamination.

Career Highlights

Throughout his career, Alan C Janos has worked with prominent organizations, including the United States of America as represented by the United States and Fusion Systems Corporation. His innovative contributions have been instrumental in advancing plasma technology.

Collaborations

He has collaborated with notable individuals in the field, including Masaaki Yamada and Harold P Furth. Their combined expertise has furthered the development of advanced plasma systems.

Conclusion

Alan C Janos is a distinguished inventor whose work in plasma technology has led to significant advancements in the field. His innovative patents and collaborations highlight his commitment to enhancing plasma processing systems.